Pakma, OsmanKaval, ŞehmusKari̇per, İshak Afşin2021-04-142021-04-142019-10-01Pakma, O., Kaval, Ş., Kari̇per, İ. A. (2019). Ag-doped HfO2 thin films via sol–gel dip coating method. Optical and Quantum Electronics, 51 (10), pp.342. https://doi.org/10.1007/s11082-019-2055-x0306-89191572-817Xhttps://doi.org/10.1007/s11082-019-2055-xhttps://hdl.handle.net/20.500.12402/2866In this study, undoped and Ag-doped HfO2 thin films were deposited on glass substrates by means of sol–gel dip coating method. These films were then thermally annealed at 500 °C for 1 h. The structural and optical properties of undoped and Ag-doped HfO2 thin films were characterized by X-ray diffraction, UV–Vis spectrometry and scanning electron microscope. The results of this analysis were compared and interpreted with the results obtained in literature by various methods of coating with HfO2. The X-ray diffraction peaks of the films paired with monoclinic HfO2 crystalline peaks. The refractive indices of the films decreased with doping Ag, at 500 nm wavelengths. The optical band gap values of Ag-doped HfO2 thin films increased with doping Ag. The porous structures were observed on the surface films, especially with 5% Ag doping.eninfo:eu-repo/semantics/embargoedAccessAttribution-NonCommercial-NoDerivs 3.0 United StatesHafnium OxideSEMSol–GelThin FilmUV–VisArticle5110342Q2Q3