Synthesis and characterization of vanadium oxide thin films on different substrates

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Tarih

2017-04-11

Dergi Başlığı

Dergi ISSN

Cilt Başlığı

Yayıncı

Springer Nature

Erişim Hakkı

info:eu-repo/semantics/closedAccess
Attribution-NonCommercial-ShareAlike 3.0 United States

Özet

In this study, the V8O15 derivative of vanadium oxide was produced on plain glass, indium tin oxide and silicon wafer substrate layers by taking advantage of wet chemical synthesis which is an easy and economical method. The structural properties of the produced films were examined by XRD and SEM analyses. Besides, Al/VOx/p-Si metal-oxide-semiconductor (MOS) structure was obtained by the same synthesis method. Doping densities of these MOS structures were calculated from frequency dependent capacitance–voltage measurements. It was determined that the interface states which were assigned with the help of these parameters vary according to frequency.

Açıklama

Anahtar Kelimeler

Interface State, Vanadium Oxide, Amorphous Glass, Triclinic Structure, Plain Glass

Kaynak

WoS Q Değeri

Q2

Scopus Q Değeri

Q2

Cilt

28

Sayı

15

Künye

Pakma, O., Özaydın, C., Özden, Ş, Kariper, I. A., Güllü, Ö. (2017). Synthesis and characterization of vanadium oxide thin films on different substrates. Journal of Materials Science: Materials in Electronics, 28(15), pp. 10909-10913. https://doi.org/10.1007/s10854-017-6870-1