Ultrahigh (100%) barrier modification of n-InP Schottky diode by DNA biopolymer nanofilms

Yükleniyor...
Küçük Resim

Tarih

2010-04

Dergi Başlığı

Dergi ISSN

Cilt Başlığı

Yayıncı

Elsevier

Erişim Hakkı

info:eu-repo/semantics/restrictedAccess
Attribution-NonCommercial-ShareAlike 3.0 United States

Özet

Here I demonstrate that DNA biopolymer molecules can control the electrical characteristics of conventional Al/n-InP metal–semiconductor contacts. Results show that DNA increases an effective barrier height as high as 0.87 eV by influencing the space charge region of n-InP device with a good rectifying behavior

Açıklama

Anahtar Kelimeler

DNA, Biopolymer, Schottky Barrier, Ideality Factor, InP

Kaynak

WoS Q Değeri

N/A

Scopus Q Değeri

N/A

Cilt

87

Sayı

4

Künye

Güllü, Ö. (2010). Ultrahigh (100%) barrier modification of n-InP Schottky diode by DNA biopolymer nanofilms. Microelectronic Engineering. 87(4). pp.648-651. https://doi.org/10.1016/j.mee.2009.09.001