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Öğe Control of barrier heigth ofmetal/semiconductor contacts bymolecular organic film(2011-06) Güllü, Ömer; Turut, Abdulmecit; Kılıçoğlu, Tahsin; Özerden, EniseÖğe Electronic properties of the Al/Orange G/n-Si junction(2017-04) Güllü, Ömer; Arsel, İsmailÖğe Organometalik mangan kompleks ince filminin bazı optik özellikleri ve fotovoltaik diyot uygulaması(Ubek Yayınevi, 2019-11) Güllü, Ömer; Özaydın, Cihat; Özaydın, Mizgin TutşiÖğe Electrical characteristics of the Al/Congo Red (CR)/p-Si semiconductor diodes(Dumlupınar Üniversitesi, 2015-05) Güllü, Ömer; Pakma, Osman; Turut, Abdulmecit; Arsel, İsmailIn this work, we have studied the electrical characteristics of the Al/CR/p-Si MIS Schottky structures formed by coating of the organic material directly on p-Si substrate. It has been seen that the CR thin film on the p-Si substrate has indicated a good rectifying behavior. The barrier height and the ideality factor of the device have been calculated from the I-V characteristic. We have also studied the suitability and possibility of the MIS diodes for use in barrier modification of Si MS diodes. In addition, we have compared the parameters of the Al/CR/p-Si MIS Schottky diodes with those of conventional Al/p-Si MS diodes. We have observed that the b value of 0.77 eV obtained for the Al/CR/p-Si device was significantly larger than BH value of the conventional Al/p-Si MS contact. Thus, the modification of the interfacial potential barrier for metal/Si diodes has been achieved by using the CR organic interlayer. This was attributed to the fact that the CR interlayer increased the effective b by influencing the space charge region of Si. The interface-state density of the MIS diode was found to vary from 1.24×1013 eV-1 cm-2 to 2.44×1012 eV-1 cm-2.Öğe Photoelectric and photocapacitance characteristics of Au/pyrene/N-Si MIS structures(Journal of Non-Oxide Glasses, 2017-04-01) Güllü, Ömer; Pakma, Osman; Özaydın, Cihat; Arsel, İsmail; Turmuş, MesutThis paper presents in-depth analysis of the current-voltage (I-V) and capacitance-voltage (C-V) characteristics of identically prepared Au/Pyrene(C16H10)/n-Si hybrid organic-oninorganic semiconductor photovoltaic cells (total 43 diodes). The barrier heights, ideality factors and reverse bias saturation currents of all devices were extracted from the electrical characteristics. The mean barrier height, mean ideality factor and mean saturation current from I-V measurements were calculated as 0.79 ± 0.01 eV, 1.40 ± 0.08 and (1.01 ± 0.46)x10-8 A, respectively. Also, the photoelectric (I-V) and photocapacitance (C-V and conductance (G)-voltage (V)) characteristics of the Au/Pyrene/n-Si device under 100 mW/cm2 light illumination were investigated. It has been seen that the light illumination increases strongly the current, capacitance and conductance values of the device due to electron-hole charge pair generation. The C-V and G-V characteristics under illumination have shown a non-monotonic dependence of capacitance on frequency giving rise to a peak. This is attributed to the existence of electrically active traps. The open circuit voltage and short circuit current of the Au/Pyrene/n-Si device were extracted as 80 mV and 30 µA, respectively.Öğe The Current voltage and Capacitance voltage frequency characteristics of the Al methyl violet n Si diode(Türk Fizik Derneği, 2016-09) Güllü, Ömer; Arsel, İsmailÖğe Current-capacitance-voltage characteristics of the Al/methyl red/n-InP diode(2017-04) Güllü, Ömer; Arsel, İsmailÖğe Electronic properties of Cu/n-InP metal-semiconductor structures with cytosine biopolymer(Polska Akademia Nauk, 2015-09) Güllü, Ömer; Türüt, AbdülmecitThis work shows that cytosine biomolecules can control the electrical characteristics of conventional Cu/n-InP metal-semiconductor contacts. A new Cu/n-InP Schottky junction with cytosine interlayer has been formed by using a drop cast process. The current-voltage (I-V) and capacitance-voltage (C-V) characteristics of Cu/cytosine/n-InP structure were investigated at room temperature. A potential barrier height as high as 0.68 eV has been achieved for Cu/cytosine/n-InP Schottky diodes, which have good I-V characteristics. This good performance is attributed to the effect of interfacial biofilm between Cu and n-InP. By using C-V measurement of the Cu/cytosine/n-InP Schottky diode the diffusion potential and the barrier height have been calculated as a function of frequency. Also, the interface-state density of the Cu/cytosine/n-InP diode was found to vary from 2:24 × 1013 eV-1cm-2 to 5.56× 1012 eV-1 cm-2.Öğe Electrical analysis of organic interlayer based metal/interlayer/semiconductor diode structures(Journal of Applied Physics, 2009-01) Güllü, Ömer; Turut, AbdulmecitIn this work, metal/interlayer/semiconductor (MIS) diodes formed by coating of an organic film to p-Si semiconductor substrate were prepared. Metal(Al)/interlayer (phenolsulfonphthalein=PSP)/semiconductor(p-Si) MIS device had a good rectifying behavior. By using the forward bias I-V characteristics, the values of ideality factor (n) and barrier height (Phi(b)) for the Al/PSP/p-Si MIS diode were obtained as 1.45 and 0.81 eV, respectively. It was seen that the Phi(b) value of 0.81 eV calculated for the Al/PSP/p-Si MIS diode was significantly larger than value of 0.50 eV of conventional Al/p-Si Schottky diodes. Modification of the interfacial potential barrier of Al/p-Si diode was achieved by using a thin interlayer of the PSP organic material. This has been attributed to the fact that the PSP organic interlayer increases the effective barrier height by influencing the space-charge region of Si. The interface-state density of the MIS diode was determined, and the interface-state density was found to vary from 3.00 x 10(13) to 2.99 x 10(12) eV(-1) cm(-2). (C) 2009 American Institute of Physics.Öğe Electrical characteristics of Co/n-Si schottky barrier diodes using I – V and C – V measurements electrical characteristics of Co/n-Si schottky barrier diodes using I – V and C – V measurements(Chinese Physics Letters, 2009-06) Güllü, Ömer; Güler, Gülşen; Karataş, Şükrü; Bakkaloğlu, Ömer FarukElectrical characteristics of Co/n-Si Schottky barrier diodes are analysed by current-voltage (I – V) and capacitance-voltage (C – V) techniques at room temperature. The electronic parameters such as ideality factor, barrier height and average series resistance are determined. The barrier height 0.76eV obtained from the C – V measurements is higher than that of the value 0.70eV obtained from the I – V measurements. The series resistance RS and the ideality factor n are determined from the d ln(I)/dV plot and are found to be 193.62Ω, and 1.34, respectively. The barrier height and the RS value are calculated from the H(I) – I plot and are found to be 0.71 eV and 205.95Ω. Furthermore, the energy distribution of the interface state density is determined from the forward bias I – V characteristics by taking into account the bias dependence of the effective barrier height. The interface state density Nss ranges from 6.484 × 1011 cm−2eV−1 in (EC – 0.446) eV to 2.801 × 1010 cm−2eV−1 in (EC – 0.631) eV, of the Co/n-Si Schottky barrier diode. The results show the presence of a thin interfacial layer between the metal and the semiconductor.
