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Öğe Ag-doped HfO2 thin films via sol–gel dip coating method(Springer Nature, 2019-10-01) Pakma, Osman; Kaval, Şehmus; Kari̇per, İshak AfşinIn this study, undoped and Ag-doped HfO2 thin films were deposited on glass substrates by means of sol–gel dip coating method. These films were then thermally annealed at 500 °C for 1 h. The structural and optical properties of undoped and Ag-doped HfO2 thin films were characterized by X-ray diffraction, UV–Vis spectrometry and scanning electron microscope. The results of this analysis were compared and interpreted with the results obtained in literature by various methods of coating with HfO2. The X-ray diffraction peaks of the films paired with monoclinic HfO2 crystalline peaks. The refractive indices of the films decreased with doping Ag, at 500 nm wavelengths. The optical band gap values of Ag-doped HfO2 thin films increased with doping Ag. The porous structures were observed on the surface films, especially with 5% Ag doping.Öğe Improvement of diode parameters in Al/n-Si schottky diodes with coronene interlayer using variation of the illumination intensity(Elsevier, 2017-12-15) Pakma, Osman; Çavdar, Şükrü; Koralay, Haluk; Tuğluoğlu, Nihat; Yüksel, Ömer FarukIn present work, Coronene thin films on Si wafer have been deposited by the spin coating method. It has been ultimately produced Al/Coronene/n-Si/In Schottky diode. Current–voltage (I-V) measurements have been used to determine the effect of illumination intensity in the Schottky diodes. The barrier height (ΦB) values increased as ideality factor (n) values decreased with a increase in illumination intensity. The ΦB values have been found to be 0.697 and 0.755 eV at dark and 100 mW/cm2, respectively. The n values have been found to be 2.81 and 2.07 at dark and 100 mW/cm2, respectively. Additionally, the series resistance (Rs) values from modified Norde method and interface state density (Nss) values using current-voltage measurements have been determined. The values of Rs have been found to be 1924 and 5094 Ω at dark and 100 mW/cm2, respectively. The values of Nss have been found to be 4.76 × 1012 and 3.15 × 1012 eV−1 cm−2 at dark and 100 mW/cm2, respectively. The diode parameters are improved by applying the variation of illumination intensity to the formed Schottky diodes.Öğe Assessment of natural radiation exposure levels and mass attenuation coefficients of lime and gypsum samples used in Turkey(Springer Nature, 2009-11-17) Damla, Nevzat; Çevik, Uğur; Kobya, Ali İhsan; Çelik, Ahmet; Çelik, NecatiThe activity concentrations of 226Ra, 232Th, and 40K in lime and gypsum samples used as building materials in Turkey were measured using gamma spectrometry. The mean activity concentrations of 226Ra, 232Th, and 40K were found to be 38 ± 16, 20 ± 9, and 156 ± 54 Bq kg − 1 for lime and found to be 17 ± 6, 13 ± 5, and 429 ± 24 Bq kg − 1 for gypsum, respectively. The radiological hazards due to the natural radioactivity in the samples were inferred from calculations of radium equivalent activities (Raeq), indoor absorbed dose rate in the air, the annual effective dose, and gamma and alpha indices. These radiological parameters were evaluated and compared with the internationally recommended limits. The experimental mass attenuation coefficients (μ/ρ) of the samples were determined in the energy range 81–1,332 keV. The experimental mass attenuation coefficients were compared with theoretical values obtained using XCOM. It is found that the calculated values and the experimental results are in good agreement.Öğe Electrical properties of safranine T p Si organic inorganic semiconductor devices(Cambridge University, 2010-04-25) Güllü, Ömer; Asubay, Sezai; Biber, Mehmet; Kılıçoğlu, Tahsin; Turut, AbdulmecitWe investigated the current-voltage (I-V) and capacitance-voltage (C-V) characteristics of identically prepared safranine T/p-Si organic/inorganic Schottky devices (total 26 diodes) formed by evaporation of organic compound solution on p-Si semiconductor substrate. It was seen that the safranine T organic thin film on the p-Si substrate showed a good rectifying behavior. The barrier heights and ideality factors of all devices were extracted from the electrical characteristics. The mean barrier height and mean ideality factor from I-V measurements were calculated as 0.59±0.02 eV and 1.80±0.20, respectively. Also, the mean barrier height and mean acceptor doping concentration from C-V measurements were calculated as 0.67±0.10 eV and (6.96±0.37)×1014 cm-3, respectively. The discrepancy in the barrier height values obtained from I-V and C-V characteristics has been attributed to different nature of the measurements. The discrepancy between these values can also be due to the existence of the interfacial native oxide and the organic safranine T thin layer between the semiconductor substrate and top contact metal.Öğe On the energy distribution profile of interface states obtained by taking into account of series resistance in Al/TiO2/p–Si (MIS) structures(Elsevier, 2011-02-15) Pakma, Osman; Serin, Necmi; Serin, Saliha Tülay; Altındal, ŞemsettinThe energy distribution profile of the interface states (Nss) of Al/TiO2/pSi (MIS) structures prepared using the solgel method was obtained from the forward bias currentvoltage (IV) characteristics by taking into account both the bias dependence of the effective barrier height (φe) and series resistance (Rs) at room temperature. The main electrical parameters of the MIS structure such as ideality factor (n), zero-bias barrier height (φb0) and average series resistance values were found to be 1.69, 0.519 eV and 659 Ω, respectively. This high value of n was attributed to the presence of an interfacial insulator layer at the Al/pSi interface and the density of interface states (Nss) localized at the Si/TiO2 interface. The values of Nss localized at the Si/TiO2 interface were found with and without the Rs at 0.25-Ev in the range between 8.4×10 13 and 4.9×1013 eV-1 cm-2. In addition, the frequency dependence of capacitancevoltage (CV) and conductancevoltage (G/ω-V) characteristics of the structures have been investigated by taking into account the effect of Nss and R s at room temperature. It can be found out that the measured C and G/ω are strongly dependent on bias voltage and frequency.Öğe Barrier enhancement of Al/n-InP Schottky diodes by graphene oxide thin layer(Scientific Publishers, 2019) Güllü, Ömer; Çankaya, Murat; Rajagopal Reddy, VarraIn the present work, the surface morphology, structural and optical features of graphene oxide (GO) films are investigated. The Al/GO/n-InP MIS diode is formed by depositing GO layer on n-InP wafer for the barrier enhancement. Interfacial properties of the MIS diode with GO interlayer are extracted from current–voltage (I–V) measurement. The simple diode parameters such as barrier height and ideality factor are extracted from I–V plots, and the values are compared with those of conventional Al/n-InP MS contact. The value of barrier height (BH) for the Al/GO/n-InP contact is found as 0.85 eV. The BH value of 0.85 eV of the Al/GO/n-InP MIS structure is as high as around 100% compared to the value of 0.43 eV of the Al/n-InP reference contacts. We have showed that the value of 0.85 eV is one of the highest values presented for reference contacts with an interlayer.Öğe Room temperature I–V and C–V characteristics of Au/mTPP/p-Si organic MIS devices(The European Physical Journal Applied Physics, 2018-05-02) Güllü, Ömer; Pakma, Osman; Özden, ŞadanThe room temperature electrical characteristics of the organic Au/mTPP/p-Si device fabricated by spin coating method were investigated with I–V and C–V measurements. It has been determined that the device has a high rectification coefficient and current transport is dominated by the thermionic emission. The serial resistance value is calculated at 92 ohms with two different approaches. Serial resistance effects were also found to be effective in C–V and G–V measurements. The different barrier heights from the I–V and C–V measurements indicate possible interface and trap states or barrier inhomogeneities.
