Arama Sonuçları

Listeleniyor 1 - 10 / 45
  • Öğe
    N-type InP Schottky diodes with organic thin layer: Electrical and interfacial properties
    (Journal of Vacuum Science & Technology B, 2010-03) Güllü, Ömer; Turut, Abdulmecit
    The rectifying junction characteristics of methyl red (MR) organic film on n-type InP substrate have been studied. It has been observed that MR-based structure shows an excellent rectifying behavior and that the MR film increases the effective barrier height by influencing the space charge region of the n-type InP. The barrier height and ideality factor values for this structure have been obtained as 0.75 eV and 1.93 from the forward bias current-voltage characteristics, respectively. By using capacitance-voltage characteristics at 1 MHz, the barrier height and the carrier concentration values have been calculated as 0.93 eV and 5.13×1015 cm−3, respectively. The energy distributions of the interface states and their relaxation times have been determined from the forward bias capacitance-frequency and conductance-frequency characteristics. Moreover, it was seen that both the interface-state density and the relaxation time of the interface states decreased with bias voltage from experimental results.
  • Öğe
    Control of barrier heigth ofmetal/semiconductor contacts bymolecular organic film
    (2011-06) Güllü, Ömer; Turut, Abdulmecit; Kılıçoğlu, Tahsin; Özerden, Enise
  • Öğe
    Batman ilindeki ince film a-Si teknolojili fotovoltaik sistemin performans değerlendirmesi
    (Balıkesir Üniversitesi, 2018-07-17) Pakma, Osman
    Bu çalışmada Batman ilinde ince film a-Si teknolojisine sahip 2.16 kWp güce sahip şebeke bağlantılı sistemin bir yıllık elektrik enerjisi üretim verileri alınmış ve modüllerin performansı dış parametrelerde göz önüne alınarak değerlendirilmiştir. Sistem ölçümleri Ocak ayından Aralık ayına kadar tüm 2016 yılını kapsamaktadır. İnce film a-Si PV sistemden 2016 yılı süresince şebekeye 2.631 MWh enerji sağlanmıştır. Sistemin nihai verimi (Yf) 1.13 den 4.89 kWh/KWp/gün’e, performans oranı da (PO) %53 ile %78 arasında değişmektedir. Ortam ve buna bağlı olarak modül sıcaklıklarının sistem performansına etkisinin %6 - %9 arasında olduğu hesaplanmıştır. Ayrıca diğer sistem bölümlerinin de sistem performansı üzerinde değişen oranlarda etkili olduğu belirlenmiştir.
  • Öğe
    Electronic properties of the Al/Orange G/n-Si junction
    (2017-04) Güllü, Ömer; Arsel, İsmail
  • Öğe
    Organometalik mangan kompleks ince filminin bazı optik özellikleri ve fotovoltaik diyot uygulaması
    (Ubek Yayınevi, 2019-11) Güllü, Ömer; Özaydın, Cihat; Özaydın, Mizgin Tutşi
  • Öğe
    Al/Nigrosin/p-Si yapıların fabrikasyonu ve temel diyot parametrelerinin hesaplanması
    (Dicle Üniversitesi, 2018-09-25) Güllü, Ömer
    Bu çalışmada π bağları açısından zengin organik molekülün (Nigrosin (NIG)) optik özellikleri UV-Vis yöntemiyle belirlendi. Cam altlık üzerinde damlatma yöntemi ile büyütülen NIG ince tabakasının direkt yasak enerji değerleri; 1,42 eV (Q bandı) ve 2,94 eV (B bandı) olarak rapor edildi. Oluşturulan referans Al/p-Si ve Al/NIG/p-Si Metal/Organik aratabaka/Yarıiletken (MIS) yapılarının I-V ölçümleri sonunda tüm yapıların doğrultucu özelliğe sahip oldukları gözlemlendi. Oda sıcaklığında alınan I-V ölçümleri kullanılarak yapıların karakteristik diyot özellikleri belirlendi. Burada Al/NIG/p-Si diyotunun kapasitör özelliği, C-V ölçümleri alınarak incelendi ve yapılan hesaplamalar sonucunda bazı diyot parametreleri elde edildi. Elde edilen sonuçlar, π bağları açısından zengin olan NIG gibi organik malzemelerin elektronik sahasında kullanılabileceğini gösterdi.
  • Öğe
    Wet chemical methods for producing mixing crystalline phase ZrO 2 thin film
    (Elsevier, 2016-07) Pakma, Osman; Özdemir, Cengiz; Kariper, İshak Afşin; Özaydın, Cihat; Güllü, Ömer
    The aim of the study is to develop a more economical and easier method for obtaining ZrO 2 thin films at lower temperature, unlike the ones mentioned in the literature. For this purpose, wet chemical synthesis methods have been tested and XRD, UV-VIS and SEM analysis of ZrO 2 thin films have been performed. At the end of the analysis, we identified the best method and it has been found that the features of the films produced with this method were better than the films produced by using different reagents, as well as the films reported in the literature. Especially it has been observed that the transmittance of the film produced with this method were higher and better than the films in the literature and the others. In addition, refractive index of the film produced with this method was observed to be lower. Moreover, by using the same method Al/ZrO 2 /p-Si structure has been obtained and it has been compared with Al/p-Si reference structure in terms of electrical parameters.
  • Öğe
    Improvement of diode parameters in Al/n-Si schottky diodes with coronene interlayer using variation of the illumination intensity
    (Elsevier, 2017-12-15) Pakma, Osman; Çavdar, Şükrü; Koralay, Haluk; Tuğluoğlu, Nihat; Yüksel, Ömer Faruk
    In present work, Coronene thin films on Si wafer have been deposited by the spin coating method. It has been ultimately produced Al/Coronene/n-Si/In Schottky diode. Current–voltage (I-V) measurements have been used to determine the effect of illumination intensity in the Schottky diodes. The barrier height (ΦB) values increased as ideality factor (n) values decreased with a increase in illumination intensity. The ΦB values have been found to be 0.697 and 0.755 eV at dark and 100 mW/cm2, respectively. The n values have been found to be 2.81 and 2.07 at dark and 100 mW/cm2, respectively. Additionally, the series resistance (Rs) values from modified Norde method and interface state density (Nss) values using current-voltage measurements have been determined. The values of Rs have been found to be 1924 and 5094 Ω at dark and 100 mW/cm2, respectively. The values of Nss have been found to be 4.76 × 1012 and 3.15 × 1012 eV−1 cm−2 at dark and 100 mW/cm2, respectively. The diode parameters are improved by applying the variation of illumination intensity to the formed Schottky diodes.
  • Öğe
    Electrical characteristics of the Al/Congo Red (CR)/p-Si semiconductor diodes
    (Dumlupınar Üniversitesi, 2015-05) Güllü, Ömer; Pakma, Osman; Turut, Abdulmecit; Arsel, İsmail
    In this work, we have studied the electrical characteristics of the Al/CR/p-Si MIS Schottky structures formed by coating of the organic material directly on p-Si substrate. It has been seen that the CR thin film on the p-Si substrate has indicated a good rectifying behavior. The barrier height and the ideality factor of the device have been calculated from the I-V characteristic. We have also studied the suitability and possibility of the MIS diodes for use in barrier modification of Si MS diodes. In addition, we have compared the parameters of the Al/CR/p-Si MIS Schottky diodes with those of conventional Al/p-Si MS diodes. We have observed that the b value of 0.77 eV obtained for the Al/CR/p-Si device was significantly larger than BH value of the conventional Al/p-Si MS contact. Thus, the modification of the interfacial potential barrier for metal/Si diodes has been achieved by using the CR organic interlayer. This was attributed to the fact that the CR interlayer increased the effective b by influencing the space charge region of Si. The interface-state density of the MIS diode was found to vary from 1.24×1013 eV-1 cm-2 to 2.44×1012 eV-1 cm-2.
  • Öğe
    Morphological, structural and optical characteristics of graphene oxide layers and metal/interlayer/semiconductor photovoltaic diode application
    (National Institute of Research and Development for Optoelectronics, 2018) Güllü, Ömer; Çankaya, Murat
    This work describes the optical, morphological and structural characterizations of graphene oxide (GO) layers grown by drop casting and annealing process. UV-vis optical measurement shows that the values of direct and indirect optical gap energy of the GO film are 3.89 eV and 3.21 eV, respectively. The graphene oxide (GO) layer has been placed in the metal/ interlayer /semiconductor (MIS) diodes (total 17 devices) on p-Si wafers. The graphene oxide diodes give a better barrier height enhancement as compared with the conventional diodes. The value of homogeneous barrier height for Al/GO/p-Si MIS junctions was extracted as 0.74 eV. The diodes were also investigated under 300 watt light illumination for photovoltaic applications. Additionally, interfacial properties of the MIS diode with GO interlayer were determined. It has been seen that the capacitance of the device changes as a function of gate voltage and signal frequency from the capacitance-frequency measurements. It has also been reported that the interfacial trap charges reduce the capacitance with increasing frequency values.