Arama Sonuçları

Listeleniyor 1 - 10 / 20
  • Öğe
    N-type InP Schottky diodes with organic thin layer: Electrical and interfacial properties
    (Journal of Vacuum Science & Technology B, 2010-03) Güllü, Ömer; Turut, Abdulmecit
    The rectifying junction characteristics of methyl red (MR) organic film on n-type InP substrate have been studied. It has been observed that MR-based structure shows an excellent rectifying behavior and that the MR film increases the effective barrier height by influencing the space charge region of the n-type InP. The barrier height and ideality factor values for this structure have been obtained as 0.75 eV and 1.93 from the forward bias current-voltage characteristics, respectively. By using capacitance-voltage characteristics at 1 MHz, the barrier height and the carrier concentration values have been calculated as 0.93 eV and 5.13×1015 cm−3, respectively. The energy distributions of the interface states and their relaxation times have been determined from the forward bias capacitance-frequency and conductance-frequency characteristics. Moreover, it was seen that both the interface-state density and the relaxation time of the interface states decreased with bias voltage from experimental results.
  • Öğe
    Batman ilindeki ince film a-Si teknolojili fotovoltaik sistemin performans değerlendirmesi
    (Balıkesir Üniversitesi, 2018-07-17) Pakma, Osman
    Bu çalışmada Batman ilinde ince film a-Si teknolojisine sahip 2.16 kWp güce sahip şebeke bağlantılı sistemin bir yıllık elektrik enerjisi üretim verileri alınmış ve modüllerin performansı dış parametrelerde göz önüne alınarak değerlendirilmiştir. Sistem ölçümleri Ocak ayından Aralık ayına kadar tüm 2016 yılını kapsamaktadır. İnce film a-Si PV sistemden 2016 yılı süresince şebekeye 2.631 MWh enerji sağlanmıştır. Sistemin nihai verimi (Yf) 1.13 den 4.89 kWh/KWp/gün’e, performans oranı da (PO) %53 ile %78 arasında değişmektedir. Ortam ve buna bağlı olarak modül sıcaklıklarının sistem performansına etkisinin %6 - %9 arasında olduğu hesaplanmıştır. Ayrıca diğer sistem bölümlerinin de sistem performansı üzerinde değişen oranlarda etkili olduğu belirlenmiştir.
  • Öğe
    Al/Nigrosin/p-Si yapıların fabrikasyonu ve temel diyot parametrelerinin hesaplanması
    (Dicle Üniversitesi, 2018-09-25) Güllü, Ömer
    Bu çalışmada π bağları açısından zengin organik molekülün (Nigrosin (NIG)) optik özellikleri UV-Vis yöntemiyle belirlendi. Cam altlık üzerinde damlatma yöntemi ile büyütülen NIG ince tabakasının direkt yasak enerji değerleri; 1,42 eV (Q bandı) ve 2,94 eV (B bandı) olarak rapor edildi. Oluşturulan referans Al/p-Si ve Al/NIG/p-Si Metal/Organik aratabaka/Yarıiletken (MIS) yapılarının I-V ölçümleri sonunda tüm yapıların doğrultucu özelliğe sahip oldukları gözlemlendi. Oda sıcaklığında alınan I-V ölçümleri kullanılarak yapıların karakteristik diyot özellikleri belirlendi. Burada Al/NIG/p-Si diyotunun kapasitör özelliği, C-V ölçümleri alınarak incelendi ve yapılan hesaplamalar sonucunda bazı diyot parametreleri elde edildi. Elde edilen sonuçlar, π bağları açısından zengin olan NIG gibi organik malzemelerin elektronik sahasında kullanılabileceğini gösterdi.
  • Öğe
    Morphological, structural and optical characteristics of graphene oxide layers and metal/interlayer/semiconductor photovoltaic diode application
    (National Institute of Research and Development for Optoelectronics, 2018) Güllü, Ömer; Çankaya, Murat
    This work describes the optical, morphological and structural characterizations of graphene oxide (GO) layers grown by drop casting and annealing process. UV-vis optical measurement shows that the values of direct and indirect optical gap energy of the GO film are 3.89 eV and 3.21 eV, respectively. The graphene oxide (GO) layer has been placed in the metal/ interlayer /semiconductor (MIS) diodes (total 17 devices) on p-Si wafers. The graphene oxide diodes give a better barrier height enhancement as compared with the conventional diodes. The value of homogeneous barrier height for Al/GO/p-Si MIS junctions was extracted as 0.74 eV. The diodes were also investigated under 300 watt light illumination for photovoltaic applications. Additionally, interfacial properties of the MIS diode with GO interlayer were determined. It has been seen that the capacitance of the device changes as a function of gate voltage and signal frequency from the capacitance-frequency measurements. It has also been reported that the interfacial trap charges reduce the capacitance with increasing frequency values.
  • Öğe
    Electrical analysis of organic dye based MIS Schottky contacts
    (Microelectronic Engineering, 2010-05-25) Güllü, Ömer; Turut, Abdulmecit
    In this work, we prepared metal/interlayer/semiconductor (MIS) diodes by coating of an organic film onp-Si substrate. Metal(Al)/interlayer(Orange G@OG)/semiconductor(p-Si) MIS structure had a good recti-fying behavior. By using the forward-biasI–Vcharacteristics, the values of ideality factor (n) and barrierheight (BH) for the Al/OG/p-Si MIS diode were obtained as 1.73 and 0.77 eV, respectively. It was seen thatthe BH value of 0.77 eV calculated for the Al/OG/p-Si MIS diode was significantly larger than the value of0.50 eV of conventional Al/p-Si Schottky diodes. Modification of the potential barrier of Al/p-Si diode wasachieved by using thin interlayer of the OG organic material. This was attributed to the fact that the OGorganic interlayer increased the effective barrier height by influencing the space charge region of Si. Theinterface-state density of the MIS diode was found to vary from 2.79x1013to 5.80x1012eVx1cmx2.
  • Öğe
    Electronic properties of the metal organic interlayer inorganic semiconductor sandwich device
    (Elsevier, 2010-03) Güllü, Ömer; Turut, Abdulmecit; Kılıçoğlu, Tahsin
    In this study, we prepared a Metal(Al)/Organic Interlayer(Congo Red=CR)/Inorganic Semiconductor (p-Si) (MIS) Schottky device formed by coating of an organic film on p-Si semiconductor wafer. The Al/CR/p-Si MIS device had a good rectifying behavior. By using the forward bias I–V characteristics, the values of ideality factor (n) and barrier height (Φb) for the Al/CR/p-Si MIS device were obtained as 1.68 and 0.77 eV, respectively. It was seen that the Φb value of 0.77 eV calculated for the Al/CR/p-Si MIS device was significantly higher than value of 0.50 eV of the conventional Al/p-Si Schottky diodes. Modification of the interfacial potential barrier of the Al/p-Si diode was achieved by using a thin interlayer of the CR organic material. This was attributed to the fact that the CR organic interlayer increased the effective barrier height by influencing the space charge region of Si. The interface-state density of the MIS diode was found to vary from 1.24×1013 to 2.44×1012 eV−1 cm−2.
  • Öğe
    Photoelectric and photocapacitance characteristics of Au/pyrene/N-Si MIS structures
    (Journal of Non-Oxide Glasses, 2017-04-01) Güllü, Ömer; Pakma, Osman; Özaydın, Cihat; Arsel, İsmail; Turmuş, Mesut
    This paper presents in-depth analysis of the current-voltage (I-V) and capacitance-voltage (C-V) characteristics of identically prepared Au/Pyrene(C16H10)/n-Si hybrid organic-oninorganic semiconductor photovoltaic cells (total 43 diodes). The barrier heights, ideality factors and reverse bias saturation currents of all devices were extracted from the electrical characteristics. The mean barrier height, mean ideality factor and mean saturation current from I-V measurements were calculated as 0.79 ± 0.01 eV, 1.40 ± 0.08 and (1.01 ± 0.46)x10-8 A, respectively. Also, the photoelectric (I-V) and photocapacitance (C-V and conductance (G)-voltage (V)) characteristics of the Au/Pyrene/n-Si device under 100 mW/cm2 light illumination were investigated. It has been seen that the light illumination increases strongly the current, capacitance and conductance values of the device due to electron-hole charge pair generation. The C-V and G-V characteristics under illumination have shown a non-monotonic dependence of capacitance on frequency giving rise to a peak. This is attributed to the existence of electrically active traps. The open circuit voltage and short circuit current of the Au/Pyrene/n-Si device were extracted as 80 mV and 30 µA, respectively.
  • Öğe
    Electrical properties of organic–ınorganic semiconductor device based on rhodamine-101
    (SpringerLink, 2009-05) Güllü, Ömer; Turut, Abdulmecit; Yıldırım, Nezir; Çakar, Muzaffer
    Rhodamine-101 (Rh101) thin films on n-type Si substrates have been formed by means of evaporation, thus Sn/Rh101/n-Si heterojunctions have been fabricated. The Sn/Rh101/n-Si devices are rectifying. The optical energy gaps have been determined from the absorption spectra in the wavelength range of 400 nm to 700 nm. Rh101 has been characterized by direct optical absorption with an optical edge at 2.05 ± 0.05 eV and by indirect optical absorption with␣an optical edge at 1.80 ± 0.05 eV. It was demonstrated that trap-charge-limited current is the dominant transport mechanism at large forward bias. A␣mobility value of μ = 7.31 × 10−6 cm2 V−1 s−1 for Rh101 has been obtained from the forward-bias current–voltage characteristics.
  • Öğe
    Electrical analysis of organic interlayer based metal/interlayer/semiconductor diode structures
    (Journal of Applied Physics, 2009-01) Güllü, Ömer; Turut, Abdulmecit
    In this work, metal/interlayer/semiconductor (MIS) diodes formed by coating of an organic film to p-Si semiconductor substrate were prepared. Metal(Al)/interlayer (phenolsulfonphthalein=PSP)/semiconductor(p-Si) MIS device had a good rectifying behavior. By using the forward bias I-V characteristics, the values of ideality factor (n) and barrier height (Phi(b)) for the Al/PSP/p-Si MIS diode were obtained as 1.45 and 0.81 eV, respectively. It was seen that the Phi(b) value of 0.81 eV calculated for the Al/PSP/p-Si MIS diode was significantly larger than value of 0.50 eV of conventional Al/p-Si Schottky diodes. Modification of the interfacial potential barrier of Al/p-Si diode was achieved by using a thin interlayer of the PSP organic material. This has been attributed to the fact that the PSP organic interlayer increases the effective barrier height by influencing the space-charge region of Si. The interface-state density of the MIS diode was determined, and the interface-state density was found to vary from 3.00 x 10(13) to 2.99 x 10(12) eV(-1) cm(-2). (C) 2009 American Institute of Physics.
  • Öğe
    A study of the rectifying behaviour of aniline green-based Schottky diode
    (Elsevier, 2010-02) Güllü, Ömer; Aydoğan, Şakir
    An Al/aniline green (AG)/Ga2Te3 device was fabricated and the current–voltage (I–V), capacitance–voltage (C–V) and capacitance–frequency (C–f) characteristics of the device have been investigated at room temperature. The values of the ideality factor, series resistance and barrier height obtained from Cheung and Norde methods were compared, and it was seen that there was an agreement with each other. It was seen that the forward bias current–voltage characteristics at sufficiently large voltages has shown the effect of the series resistance. In addition, it was seen from the C–f characteristics that the values of capacitance have been decreased towards to the high frequencies. The higher values of capacitance at low frequencies were attributed to the excess capacitance resulting from the interface states in equilibrium with the Ga2Te3 that can follow the ac signal.